Method for performing a manufacturing process and associated apparatuses

A set of patterning devices comprising:

• at least one first patterning device comprising first features configured for use in a lithographic process to form corresponding first structures on a substrate, wherein the first features comprise a first patterning characteristic;
• and
• at least one second patterning device comprising second features configured for use in a lithographic process to form corresponding second structures on a substrate, wherein the second features comprise a second patterning characteristic,
• wherein the first features form a first pattern and the second features form a second pattern, the first and second patterns being complementary patterns for forming a layer of a device, and
• wherein the first and second patterning characteristics relate to an expected quality of patterning of the first structures and the second structures based on a corresponding process setting.