Exposure method and exposure device thereof

An exposure method, comprising the following steps:

• confirming that a point to be exposed is located at a central position of a capture visual field;
• after confirming that the point to be exposed is located at the central position of the capture visual field, adjusting a lens to focus if the point to be exposed is displayed obscurely until the point to be exposed is displayed in an optimal clear state;
• attempting, by the lens, to automatically capture the point to be exposed, and confirming successful capture;
• capturing the point to be exposed for many times, and confirming the number of captures;
• individually configuring a set of light sources for each region to be exposed, sequentially adjusting the light sources for each region to be exposed, and repeatedly adjusting to find the optimal light source;
• calculating a triple standard deviation of a measurement value of the optimal light source;
• and
• when the triple standard deviation is less than 2, completing an exposure operation by the exposure machine using an exposure mask.

An exposure device, comprising:

• a confirming member, configured to confirm a position of a point to be exposed in a region to be exposed;
• a capture member, configured to capture the point to be exposed and confirm that the point to be exposed is successfully captured;
• a light source adjustment member, configured to adjust a light source corresponding to the successfully captured point to be exposed to an adaptive position;
• and
• an exposure machine, configured to complete an exposure operation after the light source of the point to be exposed is adjusted to the adaptive position.