High-throughput multi-stage manufacturing platform and method for processing a plurality of substrates
AssigneeTokyo Electron Limited
InventorKandabara N. Tapily
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AssigneeTokyo Electron Limited
InventorKandabara N. Tapily
Estimating the term…
A high-throughput manufacturing platform and a method for processing semiconductor substrates using the platform. The platform includes a plurality of process modules that include a first process module configured for performing a blocking layer deposition process, a second process module configured for performing a film deposition process, and a third process module configured for performing an etch process, where the blocking layer deposition process requires a longer processing time for each substrate than the film deposition process and the etch process, and where the first process module is configured for simultaneously processing a greater number of substrates than the second and third process modules. A substrate metrology module is hosted on the platform, the substrate metrology module includes an inspection system operable for measuring data associated with an attribute of a substrate at least one of before or after the substrate is processed in a process module of the platform.
A manufacturing platform for fabrication of electronic devices on a plurality of substrates, the manufacturing platform comprising:
A method for fabrication of electronic devices on a plurality of substrates in a manufacturing platform, the method comprising:
Dependencies are inferred from the claim text.