Mask blanks and methods for depositing layers on mask blank
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHsin-Chang LEE, Pei-Cheng HSU, Ta-Cheng LIEN, Wen-Chang HSUEH
Life of this patent
Estimating the term…
Abstract
A reflective mask blank includes a substrate, a reflective multilayer (RML) disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer has length or width dimensions smaller than the capping layer, and part of the capping layer is exposed by the absorber layer. The dimension of the absorber layer and the hard mask layer ranges between 146 cm to 148 cm. The dimensions of the substrate, the RML, and the capping layer range between 150 cm to 152 cm.
Claims20
A reflective mask blank, comprising:
- a substrate;
- a reflective multilayer (RML) disposed on the substrate;
- a capping layer disposed on the reflective multilayer;
- and
- an absorber layer disposed on the capping layer, wherein
- the absorber layer has length or width dimensions in a plan view smaller than the capping layer, and
- part of the capping layer is exposed from the absorber layer.
A method of manufacturing a mask blank, comprising:
- forming a reflective multilayer (RML) on a substrate;
- forming a capping layer on the RML;
- and
- forming an absorber layer on the capping layer, the absorber layer having length or width dimensions in a plan view smaller than the capping layer, and the absorber layer exposing part of the capping layer.
A method of manufacturing a mask blank, comprising:
- forming a reflective multilayer (RML) on a substrate;
- forming a capping layer on the RML;
- positioning a shielding plate over the capping layer, the shielding plate including an opening;
- and
- forming an absorber layer on the capping layer through the opening, wherein the opening is sized such that the absorber layer formed in the capping layer having length or width dimensions in a plan view smaller than the capping layer, and the absorber layer exposes part of the capping layer.
Dependencies are inferred from the claim text.