Plasma cleaning apparatus and semiconductor process equipment with the same

A plasma cleaning apparatus comprising:

• a metal chamber connected to a vacuum tube connecting a process chamber and a vacuum pump and having a first opening;
• a trap positioned in an inner space of the metal chamber, configured of a porous member having a plurality of holes passing a process gas, and trapping an undecomposed precursor and a process by-product in the process gas;
• a dielectric coupled to the outside of the metal chamber around the first opening;
• a high voltage electrode positioned on an outer surface of the dielectric;
• and
• a gate installed between the trap and the dielectric inside the metal chamber and having a first position blocking between the trap and the dielectric and a second position opening between the trap and the dielectric, the first position and the second position switchable with each other,
• wherein when the gate is at the second position, a driving voltage is applied to the high voltage electrode such that plasma cleaning is performed.