Catalytic chemical vapour deposition
AssigneeAGT Management & Engineering AG
InventorsAida FUENTE-CUESTA, Cristian SAVANIU, Manfred LENZI, John T S IRVINE
Life of this patent
Estimating the term…
Abstract
A method for processing a gas stream comprising CO2 and at least three other gases selected from CO, H2, CH4, n-C2, n-C3, n-C4, n-05, n-C6, O2, H2O and N2, the method comprising utilising the gas stream in a catalytic chemical vapour deposition process, thereby reducing the CO2 content of the gas stream.
Claims23
A method for processing a gas stream comprising CO2 and at least three other gases selected from CO, H2, CH4, n-C2, n-C3, n-C4, n-C6, n-C6, O2, H2O and N2, the method comprising utilising the gas stream in a catalytic chemical vapour deposition process, thereby reducing the CO2 content of the gas stream.
(canceled)
The use of a gasified biomass stream or a LTC gas stream in a catalytic chemical vapour deposition process.
An apparatus for processing a gas stream, the apparatus comprising:
- a reactor for receiving a catalyst therein, the reactor having a gas inlet and a separate gas outlet;
- a heat source for heating the reactor;
- a supply of a gas stream;
- and
- a gas control system which controls the supply of the gas stream to the gas inlet of the reactor.
A method for producing carbon nanotubes, the method comprising carrying out a catalytic chemical vapour deposition process using a gasified biomass stream or a LTC gas stream.
Dependencies are inferred from the claim text.