Photoelectric conversion element and solid-state imaging device
AssigneeNational University Corporation Shizuoka University
InventorShoji KAWAHITO
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AssigneeNational University Corporation Shizuoka University
InventorShoji KAWAHITO
Estimating the term…
A photoelectric conversion element encompasses a depletion-layer extension-promotion region having a p-type upper layer, a p-type photoelectric conversion layer in contact with the depletion-layer extension-promotion region, and an n-type surface-buried region buried in an upper portion of the photoelectric conversion layer, configured to implement a photodiode together with the photoelectric conversion layer. A first p-well is surrounded by a first n-tab, the first n-tab is surrounded by a second p-well, the second p-well is surrounded by a second n-tab, and the second n-tab is surrounded by a third p-well. An injection-blocking element blocks injection of carriers of opposite conductivity type to signal charges from the second p-well into the photoelectric conversion layer, and the inside of the photoelectric conversion layer is depleted by a voltage applied to the depletion-layer extension-promotion region.
A photoelectric conversion element, comprising:
A solid-state imaging device merged in a single semiconductor chip, comprising:
Dependencies are inferred from the claim text.