Compositions for the filling of high aspect ratio vertical interconnect access (via) holes
AssigneeHeraeus Precious Metals North America Conshohocken LLC
InventorSeigi Suh
Life of this patent
Estimating the term…
Loading patent…
AssigneeHeraeus Precious Metals North America Conshohocken LLC
InventorSeigi Suh
Estimating the term…
A solvent-free electroconductive composition may be used to make electroconductive lines on a surface of a substrate or electroconductive plugs within via holes of a substrate. The solvent-free electroconductive composition is generally made of about 40 to about 95 wt % of a conductive component, about 4 to about 30 wt % of a polymer or oligomer comprising a reactive functional group, up to about 20 wt % of a monomeric diluent comprising a reactive functional group, and up to about 3 wt % of a curing agent. In some instances, the solvent-free electroconductive composition further includes up to about 3 wt % of a lubricating compound. Substrates made using solvent-free electroconductive compositions may be used in printed circuit boards, integrated circuits, solar cells, capacitors, resistors, thermistors, varistors, resonators, transducers, inductors, and multilayer ferrite beads.
A solvent-free electroconductive composition, the composition comprising:
Dependencies are inferred from the claim text.