Process and device for diamond synthesis by cvd
AssigneeDiarotech S.A.
InventorHoracio TELLEZ OLIVA
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Abstract
The invention relates to the improvement of synthesis by chemical vapour deposition, particularly diamond synthesis. It is proposed to reduce the time required for the deposition of diamond layers by compressing the plasma near the deposition substrate in order to increase the chances of collision between active species.
Claims10
A process for synthesising a material in a chemical vapour deposition chamber and on a synthesis substrate, between two plasma-generating electrodes, according to which:
- a carrier gas containing atoms of the material to be synthesised is introduced into the chamber and
- a plasma is created near the substrate to activate the atoms of the carrier gas containing atoms of the material to be synthesised,
- a process characterised in that the plasma is compressed to increase the volume density of activated atoms near the substrate and therefore the deposition speed of the material to be synthesised.
A process for synthesising a material in a chemical vapour deposition chamber and on a synthesis substrate, between two plasma-generating electrodes, according to which:
- a carrier gas containing atoms of the material to be synthesised is introduced into the chamber and
- a plasma is created near the substrate to activate the atoms of the carrier gas containing atoms of the material to be synthesised,
- a process characterised in that the plasma is created by applying a direct current (DC) and a radio-frequency (RF) alternating current between the two electrodes.
Dependencies are inferred from the claim text.