Sputtering target, magnetic film and method for producing magnetic film
AssigneeJX Nippon Mining & Metals Corporation
InventorsManami Masuda, Masayoshi Shimizu, Akira Shimojyuku
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Abstract
Provided is a sputtering target that can form a magnetic film having both good magnetic separation between magnetic grains and high coercive force at the same time; a magnetic film; and a method for producing a magnetic film. The sputtering target according to the present invention comprises: 1 at. % or more of Zn, a part or all of Zn forming a complex oxide(s) of Zn—Ti—O and/or Zn—Si—O; and 45 at. % or less of Pt, the balance being Co and inevitable impurities, the atomic percentage being based on an atomic ratio.
Claims10
A sputtering target according to the present invention comprises:
- 1 at. % or more of Zn, a part or all of Zn forming a complex oxide(s) of Zn—Ti—O and/or Zn—Si—O;
- and 45 at. % or less of Pt, the balance being Co and inevitable impurities, the atomic percentage being based on an atomic ratio.
A magnetic film, comprising:
- 1 at. % or more of Zn;
- Ti and/or Si;
- a part or all of the elements being present as an oxide;
- and 45 at. % or less of Pt, the balance being Co and inevitable impurities.
Dependencies are inferred from the claim text.