Back to results
US 2021/0172052 A1Published application
Vapor deposition apparatus and method
AssigneeRaytheon Technologies Corporation
InventorsErik M. Nielsen, Peter F. Gero
Life of this patent
Estimating the term…
Abstract
A vapor deposition apparatus includes a chamber configured to operate at vacuum and at least one crucible in the chamber. The crucible is configured to receive an ingot, a feeder operable to move the ingot with respect to the at least one crucible, and a heater in the chamber and configured to heat a hot zone between the at least one crucible and the feeder. A method for vapor deposition is also disclosed.
Claims20
A vapor deposition apparatus, comprising:
- a chamber configured to operate at vacuum;
- at least one crucible in the chamber, the at least one crucible configured to receive an ingot;
- a feeder operable to move the ingot with respect to the at least one crucible;
- and
- a heater in the chamber and configured to heat a hot zone between the at least one crucible and the feeder.
2 more elements
A method for vapor deposition, comprising:
- driving off moisture from an ingot in a vapor deposition chamber prior to the ingot entering a crucible;
- and
- providing the ingot to the crucible for vapor deposition.
Dependencies are inferred from the claim text.