System and method for chemical vapor deposition of synthetic diamond

A system for synthesizing a diamond by chemical vapor deposition, the system comprises:

• a vacuum chamber;
• a gas source;
• at least one hot filament unit that comprises at least one internal space;
• at least one heating element that is configured to heat the at least one internal space;
• wherein the at least one hot filament unit is positioned in a vacuum chamber;
• wherein a volume of each internal space out of the at least one internal space is smaller than one half of a volume of the vacuum chamber;
• wherein the gas source is configured to feed at least one gas to the at least one internal space;
• wherein the at least one gas comprises at least a carbon carrier gas;
• wherein the at least one hot filament unit is configured to break the at least one gas, to provide at least one radical;
• and
• wherein system is configured to deposit the at least one radical on an area of a substrate to provide the diamond.