Array substrate and method of manufacturing the same
AssigneeHkc Corporation Limited
InventorHuai Liang HE
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AssigneeHkc Corporation Limited
InventorHuai Liang HE
Estimating the term…
An array substrate and manufacturing method thereof are provided. The method includes: forming a gate metal layer on a substrate, and forming a gate insulating layer on the gate metal layer; forming amorphous silicon layer, N-type amorphous silicon layer, source and drain metals on the gate insulating layer corresponding to the gate metal layer, the source and drain metals being on same layer; forming a metal layer to be a lower metal layer of photosensor on an extension of the gate insulating layer; forming light sensing layer, passivation layer and photoresist layer on source metal, drain metal and metal layer; and forming the first light sensing layer and first passivation layer on the source and drain metals to form switch element; and forming the second light sensing layer and second passivation layer on the metal layer to form the photosensor by etching with same halftone mask.
A method of manufacturing an array substrate, comprising:
An array substrate, comprising:
An array substrate, comprising:
Dependencies are inferred from the claim text.