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US 2021/0079264 A1Published application
Polishing composition, method for producing polishing composition, polishing method, and method for producing semiconductor substrate
AssigneeFujimi Incorporated
InventorsRyota MAE, Shogo Onishi
Life of this patent
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Abstract
A polishing composition according to the present invention contains colloidal silica and a quaternary ammonium compound represented by Formula (1), wherein a pH is less than 4.0, and a zeta potential of the colloidal silica is −60 mV or higher and −35 mV or lower.
Claims8
A polishing composition, containing colloidal silica and a quaternary ammonium compound represented by the following Formula (1):
- wherein
- one or two groups among R1 to R4 each independently represent a first group, which is an alkyl group having 3 or more and 20 or less carbon atoms, an alkenyl group having 3 or more and 20 or less carbon atoms, or an aryl group having 6 or more and 20 or less carbon atoms;
- the remaining three or two groups other than the first group among R1 to R4 each independently represent a second group, which is an alkyl group having 1 or 2 carbon atoms or an alkenyl group having 2 carbon atoms;
- and
- A− represents a monovalent anion,
- wherein a pH is less than 4.0, and
- a zeta potential of the colloidal silica is −60 mV or higher and −35 mV or lower.
4 more elements
A method for producing a polishing composition, the method including mixing colloidal silica with a quaternary ammonium compound represented by the following Formula (1):
- wherein
- one or two groups among R1 to R4 each independently represent a first group, which is an alkyl group having 3 or more and 20 or less carbon atoms, an alkenyl group having 3 or more and 20 or less carbon atoms, or an aryl group having 6 or more and 20 or less carbon atoms;
- the remaining three or two groups other than the first group among R1 to R4 each independently represent a second group, which is an alkyl group having 1 or 2 carbon atoms or an alkenyl group having 2 carbon atoms;
- and
- A− represents a monovalent anion,
- wherein a pH is less than 4.0, and
- a zeta potential of the colloidal silica is −60 mV or higher and −35 mV or lower.
4 more elements
Dependencies are inferred from the claim text.