Coating method, coating apparatus, and storage medium

A coating apparatus, comprising:

• a rotary holder configured to hold and rotate a substrate;
• a liquid supplier configured to supply a film-forming liquid to a center of a front surface of the substrate held by the rotary holder;
• a cooling fluid supplier configured to supply a cooling fluid, which is a gas-liquid mixture, to an outer peripheral portion of a rear surface of the substrate;
• a first coating controller configured to rotate the substrate by the rotary holder at a first rotation speed while supplying the film-forming liquid to the center of the front surface of the substrate by the liquid supplier and configured to stop the supply of the film-forming liquid by the liquid supplier before the film-forming liquid supplied to the front surface of the substrate reaches an outer periphery of the substrate;
• a second coating controller configured to continue rotating the substrate by the rotary holder at a second rotation speed after the supply of the film-forming liquid by the liquid supplier is stopped;
• and
• a cooling controller configured to supply the cooling fluid to the outer peripheral portion of the rear surface of the substrate by the cooling fluid supplier during a supply period including at least a part of a period from a time when the supply of the film-forming liquid by the liquid supplier is stopped to a time when the rotation of the substrate at the second rotation speed is completed.