Additive Manufacturing of Polishing Pads
AssigneeApplied Materials, Inc.
InventorsAtul Bhaskar Chaudhari, Sivapackia Ganapathiappan, Srobona Sen
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Abstract
A system, formulation, and method for additive manufacturing of a polishing layer of a polishing pad. The formulation includes a urethane acrylate oligomer based on a difunctional polyol or difunctional polythiol. The techniques includes selecting the difunctional polyol or the difunctional polythiol to affect a property of the polishing layer. The formulation also includes a monomer and a photoinitiator. The viscosity of the formulation is applicable for 3D printing of the polishing layer.
Claims20
A method of synthesizing a urethane acrylate oligomer for additive manufacturing of a polishing pad, comprising:
- selecting a difunctional polyol or difunctional polythiol to affect a property of a polishing layer of the polishing pad;
- performing a catalytic reaction of the difunctional polyol or the difunctional polythiol with a difunctional isocyanate to give a urethane oligomer;
- and
- capping the urethane oligomer with an acrylate to give the urethane acrylate oligomer, wherein the urethane acrylate oligomer as applied in the additive manufacturing affects the property.
A method of synthesizing a urethane acrylate oligomer for additive manufacturing of a polishing pad, comprising:
- choosing a difunctional polyol or difunctional polythiol to affect a viscosity of a three dimensional (3D) printing formulation having the urethane acrylate oligomer in the additive manufacturing and to affect a property of a polishing layer of the polishing pad;
- reacting in presence of catalyst the difunctional polyol or the difunctional polythiol with a difunctional isocyanate to give a urethane oligomer prepolymer;
- and
- incorporating an acrylate as end caps on the urethane oligomer prepolymer to give the urethane acrylate oligomer, wherein the urethane acrylate oligomer in the additive manufacturing affects the property.
Dependencies are inferred from the claim text.