Substrate processing method, recording medium and substrate processing apparatus

A substrate processing apparatus, comprising:

• a holder configured to hold a substrate;
• a developing liquid supply configured to supply a developing liquid for forming a resist pattern onto a surface of the substrate on which a resist film is formed;
• a modifying liquid supply configured to supply a modifying liquid containing a modifying agent having a hydrophilic group onto the surface of the substrate on which the resist pattern is formed;
• a rinse liquid supply configured to supply a rinse liquid for removing the modifying liquid onto the surface of the substrate;
• a development controller configured to control the developing liquid supply to supply the developing liquid onto the surface of the substrate in a state that the substrate is held by the holder;
• a cleaning controller configured to perform multiple cycles of a cleaning processing of supplying the modifying liquid by the modifying liquid supply and supplying the rinse liquid by the rinse liquid supply onto the surface of the substrate in the state that the substrate is held by the holder;
• and
• a drying controller configured to allow, after the cleaning controller performs the multiple cycles of the cleaning processing, the holder to carry on a holding of the substrate in a state that no liquid is supplied, to thereby dry the surface of the substrate.