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US 2021/0066080 A1Published application
Methods and apparatus for depositing a chalcogenide film and structures including the film
AssigneeASM IP Holding B.V.
InventorsMiika Mattinen, Mikko Ritala, Markku Leskelä
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Abstract
Methods for depositing group 5 chalcogenides on a substrate are disclosed. The methods include cyclical deposition techniques, such as atomic layer deposition. The group 5 chalcogenides can be two-dimensional films having desirable electrical properties.
Claims32
A method of forming a structure, the method comprising:
- providing a substrate within a reaction chamber;
- providing a group 5 precursor within the reaction chamber;
- providing a chalcogen reactant within the reaction chamber;
- and
- using a cyclical deposition process, forming a layer comprising a group 5 chalcogenide on the substrate.
2 more elements
Dependencies are inferred from the claim text.