Plasma processing apparatus

Abstract

According to one embodiment, a plasma processing apparatus includes a processing container processing a substrate, a power supply supplying an electric power into the processing container to generate plasma, an upper electrode arranged inside the processing container, a substrate mounting table including a lower electrode opposed to the upper electrode, and placing the substrate thereon, an edge ring arranged at an outer peripheral portion of the substrate mounting table to surround an periphery of the substrate, and a drive mechanism driving at least part of the edge ring up and down. The edge ring includes a lower ring mounted on the outer peripheral portion of the substrate mounting table, an upper ring mounted on the lower ring to be movable up and down by the drive mechanism, and an auxiliary ring arranged at a lower surface of the upper ring to be movable up and down together with the upper ring, and including a surface facing a side to be opened to an inside of the processing container.

Dependencies are inferred from the claim text.