Defect offset correction

A method for defect map correction, comprising:

• receiving a defect map, wherein the defect map comprises a plurality of defect locations and a plurality of reference fiducial locations;
• determining multiple detected fiducial locations within image data of a semiconductor workpiece, wherein each of the multiple detected fiducial locations is based on respective multiple predetermined patterns provided in one or more scribe lines of the semiconductor workpiece;
• determining a plurality of offset corrections based on comparing each of the multiple detected fiducial locations with respective reference fiducial locations;
• and
• producing a corrected defect map by applying the plurality of offset corrections to the defect map.

A defect offset module, comprising:

• at least one processor configured to:
• receive a defect map, wherein the defect map comprises at least one defect location;
• annotate the defect map with a reference fiducial location;
• determine a detected fiducial location within image data of a semiconductor workpiece, wherein the detected fiducial location is based on a predetermined pattern provided in a scribe line of the semiconductor workpiece;
• determine an offset correction based on comparing the detected fiducial location with an associated reference fiducial location;
• and
• applying the offset correction to translocate the at least one defect location to produce a corrected defect map.