Cleaning a structure surface in an euv chamber

An apparatus comprising:

• an extreme ultraviolet (EUV) light source comprising:
• a chamber;
• and
• a target delivery system configured to direct a target toward an interaction region in the chamber, the target comprising matter that emits extreme ultraviolet light when it is converted into a plasma;
• a structure within the chamber that includes an exposed surface;
• a cleaning apparatus near the structure and configured to remove target debris from the exposed surface of the structure without removing the structure from the chamber, the cleaning apparatus comprising:
• an electrical conductor contacting a non-electrically conductive body,
• wherein the cleaning apparatus is configured to electromagnetically induce an electric current at a location adjacent the non-electrically conductive body to thereby transform a material that is present in the chamber from a first state into a plasma state that includes plasma particles, at least some of which are free radicals and ions of the material, and
• wherein the non-electrically conductive body is configured relative to the structure such that the plasma particles come in contact with the debris on the exposed surface of the structure.

An apparatus comprising:

• an extreme ultraviolet (EUV) light source comprising:
• a chamber;
• and
• a target delivery system configured to direct a target toward an interaction region in the chamber, the target comprising matter that emits extreme ultraviolet light when it is converted into a plasma;
• and
• a shroud within the chamber that defines a channel extending from the target delivery system to the interaction region, exterior surfaces of the shroud being exposed to debris produced from the target, wherein the shroud includes:
• a non-electrically conductive body that defines the channel, and
• an electrical conductor adjacent the non-electrically conductive body;
• wherein the electrical conductor electromagnetically induces an electric current at a location adjacent the shroud to thereby transform a material that is present in the chamber from a first state into a plasma state that includes plasma particles, at least some of which are free radicals and ions of the material;
• and
• wherein the electrical conductor is positioned relative to the non-electrically conductive body such that the plasma particles chemically react with debris fixed to the exposed shroud surfaces to thereby release the debris from the exposed shroud surfaces.