Resist composition and pattern formation method using same, compound and resin
AssigneesThe School Corporation Kansai University, Mitsubishi Gas Chemical Company, Inc.
InventorsHiroto KUDO, Takashi SATO, Masatoshi ECHIGO
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Abstract
The present invention provides a resist composition comprising one or more tannin compounds selected from the group consisting of a tannin comprising at least one acid dissociation reactive group in the structure and a derivative thereof, and a resin obtained using the tannin or the derivative as a monomer, and a pattern formation method using the same, a compound and a resin.
Claims14
A resist composition comprising one or more tannin compounds selected from the group consisting of a tannin comprising at least one acid dissociation reactive group in the structure and a derivative thereof, and a resin obtained using the tannin or the derivative as a monomer.
A compound represented by the following formula (0):
- wherein each A is independently a hydrogen atom, or any structure represented by the following formula (A), provided that at least one A is any structure represented by the following formula (A):
- wherein each R is independently a hydrogen atom, a substituted or unsubstituted linear alkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted branched alkyl group having 3 to 20 carbon atoms, a substituted or unsubstituted cyclic alkyl group having 3 to 20 carbon atoms, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, a substituted or unsubstituted alkenyl group having 2 to 20 carbon atoms, a halogen atom, or an acid dissociation reactive group, provided that at least one R is an acid dissociation reactive group;
- and * indicates a point of attachment to the formula (0).
A compound selected from the group consisting of a compound represented by the following formula (0-1) or the following formula (0-2), and a condensate having a structure derived from the compound represented by the following general formula (0-1) and/or the following general formula (0-2):
- wherein each R is independently a hydrogen atom, a substituted or unsubstituted linear alkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted branched alkyl group having 3 to 20 carbon atoms, a substituted or unsubstituted cyclic alkyl group having 3 to 20 carbon atoms, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, a substituted or unsubstituted alkenyl group having 2 to 20 carbon atoms, a halogen atom, or an acid dissociation reactive group, provided that at least one R is an acid dissociation reactive group.
A compound represented by the following formula (1):
- wherein each R is independently a hydrogen atom, a substituted or unsubstituted linear alkyl group having 1 to 20 carbon atoms, a substituted or unsubstituted branched alkyl group having 3 to 20 carbon atoms, a substituted or unsubstituted cyclic alkyl group having 3 to 20 carbon atoms, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, a substituted or unsubstituted alkenyl group having 2 to 20 carbon atoms, a halogen atom, or an acid dissociation reactive group, provided that at least one R is an acid dissociation reactive group.
Dependencies are inferred from the claim text.