US 2021/0063874 A1Published application

Salt, quencher, resist composition and method for producing resist pattern

AssigneeSumitomo Chemical Company, Limited

InventorsKatsuhiro KOMURO, Yuki TAKAHASHI, Koji ICHIKAWA

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Abstract

Disclosed are a salt represented by formula (1), a quencher, and a resist composition including the same: wherein R1, R2, R3 and R4 each represent a halogen atom, an alkyl fluoride group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; and m1, m2, m3 and m4 represent an integer of 0 to 4. When m1 is 2 or more, a plurality of R1 may be the same or different from each other. When m2 is 2 or more, a plurality of R2 may be the same or different from each other. When m3 is 2 or more, a plurality of R3 may be the same or different from each other. When m4 is 2 or more, a plurality of R4 may be the same or different from each other.

Claims8

Dependent claims

A salt represented by formula (I):

wherein, in formula (I),
R1, R2, R3 and R4 each independently represent a halogen atom, an alkyl fluoride group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—,
m1 represents an integer of 0 to 4, and when m1 is 2 or more, a plurality of R1 may be the same or different from each other,
m2 represents an integer of 0 to 4, and when m2 is 2 or more, a plurality of R2 may be the same or different from each other,
m3 represents an integer of 0 to 4, and when m3 is 2 or more, a plurality of R3 may be the same or different from each other, and
m4 represents an integer of 0 to 4, and when m4 is 2 or more, a plurality of R4 may be the same or different from each other.

3 more elements

Dependencies are inferred from the claim text.

Facts

Application: 17/004,068Filed 27 Aug 2020
Priority: JP 2019-15697429 Aug 2019
Published: 4 Mar 2021
Term ends: Not estimatedThe source records don’t support an estimate.

Classification11 codes

G03F 7/0045
Photosensitive materials: with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
C07C 323/62
Containing thio groups and carboxyl groups bound to the same carbon skeleton: having the sulfur atom of at least one of the thio groups bound to a…
C07C 381/12
Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00: sulfonium compounds
C07D 339/08
Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms: six-membered rings

Family

US 11,429,025 B2Related patent
US 2021/0063874 A1This patent

From the US filing history. Foreign family members aren’t listed.

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