Imaging element and method of manufacturing imaging element

A method of manufacturing an imaging element, the method comprising:

• a pixel forming process of forming a pixel on a semiconductor substrate, the pixel being configured to generate an image signal according to radiated light;
• a microlens arranging process of arranging a microlens adjacent to the formed pixel, the microlens collecting incident light to irradiate the pixel with the incident light, and flattening a surface of the pixel;
• a transparent resin layer arranging process of arranging a transparent resin layer adjacent to the arranged microlens, the transparent resin layer having a refractive index different from a refractive index of the microlens by a predetermined difference;
• and
• a sealing process of arranging a sealing glass adjacent to the arranged transparent resin layer, the sealing glass sealing the semiconductor substrate.