Laser gas regenerating apparatus and electronic device manufacturing method

A laser gas regenerating apparatus which is configured to regenerate a discharged gas discharged from at least one ArF excimer laser apparatus and to supply the regenerated gas to the at least one ArF excimer laser apparatus, the at least one ArF excimer laser apparatus being connected to a first laser gas supply source configured to supply a first laser gas containing argon gas, neon gas, and xenon gas with a first concentration and to a second laser gas supply source configured to supply a second laser gas containing argon gas, neon gas, and fluorine gas, the laser gas regenerating apparatus comprising:

• a data obtaining unit configured to obtain data on an exhaust amount of a laser gas exhausted outside without being regenerated, among discharged gases discharged from the at least one ArF excimer laser apparatus;
• a xenon adding unit configured to add, to the regenerated gas, a third laser gas containing argon gas, neon gas, and xenon gas with a second concentration higher than the first concentration;
• and
• a control unit configured to control, based on the exhaust amount, an addition amount of the third laser gas by the xenon adding unit.

An electronic device manufacturing method comprising:

• generating a laser beam with an excimer laser system, the excimer laser system including
• at least one ArF excimer laser apparatus connected to a first laser gas supply source configured to supply a first laser gas containing argon gas, neon gas, and xenon gas with a first concentration and to a second laser gas supply source configured to supply a second laser gas containing argon gas, neon gas, and fluorine gas, and
• a laser gas regenerating apparatus configured to regenerate a discharged gas discharged from the at least one ArF excimer laser apparatus and to supply the regenerated gas to the at least one ArF excimer laser apparatus, the laser gas regenerating apparatus including a data obtaining unit configured to obtain data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus, a xenon adding unit configured to add, to the regenerated gas, a third laser gas containing argon gas, neon gas, and xenon gas with a second concentration higher than the first concentration, and a control unit configured to control, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit;
• outputting the laser beam to an exposure apparatus;
• and
• exposing a photosensitive substrate to the laser beam within the exposure apparatus.

An electronic device manufacturing method comprising:

• generating a laser beam with an excimer laser system, the excimer laser system including
• at least one ArF excimer laser apparatus connected to a first laser gas supply source configured to supply a first laser gas containing argon gas, neon gas, and xenon gas with a first concentration and to a second laser gas supply source configured to supply a second laser gas containing argon gas, neon gas, and fluorine gas, and
• a laser gas regenerating apparatus configured to regenerate a discharged gas discharged from the at least one ArF excimer laser apparatus and to supply the regenerated gas to the at least one ArF excimer laser apparatus, the laser gas regenerating apparatus including a data obtaining unit configured to obtain data on an exhaust amount of a laser gas exhausted outside without being regenerated, among discharged gases discharged from the at least one ArF excimer laser apparatus, a xenon adding unit configured to add, to the regenerated gas, a third laser gas containing argon gas, neon gas, and xenon gas with a second concentration higher than the first concentration, and a control unit configured to control, based on the exhaust amount, an addition amount of the third laser gas by the xenon adding unit;
• outputting the laser beam to an exposure apparatus;
• and
• exposing a photosensitive substrate to the laser beam within the exposure apparatus.

A laser gas regenerating apparatus which is configured to regenerate a discharged gas discharged from at least one KrF excimer laser apparatus and to supply the regenerated gas to the at least one KrF excimer laser apparatus, the at least one KrF excimer laser apparatus being connected to a first laser gas supply source configured to supply a first laser gas containing krypton gas, neon gas, and xenon gas with a first concentration and to a second laser gas supply source configured to supply a second laser gas containing krypton gas, neon gas, and fluorine gas, the laser gas regenerating apparatus comprising:

• a data obtaining unit configured to obtain data on a supply amount of the second laser gas supplied to the at least one KrF excimer laser apparatus;
• a xenon adding unit configured to add, to the regenerated gas, a third laser gas containing krypton gas, neon gas, and xenon gas with a second concentration higher than the first concentration;
• and
• a control unit configured to control, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.

A laser gas regenerating apparatus which is configured to regenerate a discharged gas discharged from at least one KrF excimer laser apparatus and to supply the regenerated gas to the at least one KrF excimer laser apparatus, the at least one KrF excimer laser apparatus being connected to a first laser gas supply source configured to supply a first laser gas containing krypton gas, neon gas, and xenon gas with a first concentration and to a second laser gas supply source configured to supply a second laser gas containing krypton gas, neon gas, and fluorine gas, the laser gas regenerating apparatus comprising:

• a data obtaining unit configured to obtain data on an exhaust amount of a laser gas exhausted outside without being regenerated, among discharged gases discharged from the at least one KrF excimer laser apparatus;
• a xenon adding unit configured to add, to the regenerated gas, a third laser gas containing krypton gas, neon gas, and xenon gas with a second concentration higher than the first concentration;
• and
• a control unit configured to control, based on the exhaust amount, an addition amount of the third laser gas by the xenon adding unit.

An electronic device manufacturing method comprising:

• generating a laser beam with an excimer laser system, the excimer laser system including
• at least one KrF excimer laser apparatus connected to a first laser gas supply source configured to supply a first laser gas containing krypton gas, neon gas, and xenon gas with a first concentration and to a second laser gas supply source configured to supply a second laser gas containing krypton gas, neon gas, and fluorine gas, and
• a laser gas regenerating apparatus configured to regenerate a discharged gas discharged from the at least one KrF excimer laser apparatus and to supply the regenerated gas to the at least one KrF excimer laser apparatus, the laser gas regenerating apparatus including a data obtaining unit configured to obtain data on a supply amount of the second laser gas supplied to the at least one KrF excimer laser apparatus, a xenon adding unit configured to add, to the regenerated gas, a third laser gas containing krypton gas, neon gas, and xenon gas with a second concentration higher than the first concentration, and a control unit configured to control, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit;
• outputting the laser beam to an exposure apparatus;
• and
• exposing a photosensitive substrate to the laser beam within the exposure apparatus.

An electronic device manufacturing method comprising:

• generating a laser beam with an excimer laser system, the excimer laser system including
• at least one KrF excimer laser apparatus connected to a first laser gas supply source configured to supply a first laser gas containing krypton gas, neon gas, and xenon gas with a first concentration and to a second laser gas supply source configured to supply a second laser gas containing krypton gas, neon gas, and fluorine gas, and
• a laser gas regenerating apparatus configured to regenerate a discharged gas discharged from the at least one KrF excimer laser apparatus and to supply the regenerated gas to the at least one KrF excimer laser apparatus, the laser gas regenerating apparatus including a data obtaining unit configured to obtain data on an exhaust amount of a laser gas exhausted outside without being regenerated, among discharged gases discharged from the at least one KrF excimer laser apparatus, a xenon adding unit configured to add, to the regenerated gas, a third laser gas containing krypton gas, neon gas, and xenon gas with a second concentration higher than the first concentration, and a control unit configured to control, based on the exhaust amount, an addition amount of the third laser gas by the xenon adding unit;
• outputting the laser beam to an exposure apparatus;
• and
• exposing a photosensitive substrate to the laser beam within the exposure apparatus.