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US 2020/0402840 A1Published application
Method and device for surface treatment of substrates
AssigneeEV Group E. Thallner GmbH
InventorMarkus Wimplinger
Life of this patent
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Abstract
A method for surface treatment of an at least primarily crystalline substrate surface of a substrate such that by amorphization of the substrate surface, an amorphous layer is formed at the substrate surface with a thickness d>0 nm of the amorphous layer. This invention also relates to a corresponding device for surface treatment of substrates.
Claims19
A method for surface treatment of an at least primarily crystalline substrate surface of a substrate, the method comprising:
- applying an amorphized layer via sputtering to the substrate surface for bonding at the substrate surface of the substrate, the amorphous layer having a thickness d>0 nm.
A device for surface treatment of a substrate surface of a substrate, the device comprising:
- a process chamber for receiving the substrate;
- means for applying an amorphized layer via sputtering to the substrate surface for bonding at the substrate surface of the substrate, the amorphous layer having a thickness d>0 nm.
Dependencies are inferred from the claim text.