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US 2020/0401055 A1Published application
Conformal stage
AssigneeOnto Innovation Inc.
InventorsJ. Casey DONAHER, Edward J. FICARRA, Christopher J. MCLAUGHLIN
Life of this patent
Estimating the term…
Abstract
An improved stage for the processing of large, thin substrates, such as glass and semiconductor panels. Processing includes lithography, inspection, metrology, grinding, and the like. The stage includes a chuck that moves over a base relative to a device for processing a substrate. The chuck conforms to a geometry of the base while moving relative to the base.
Claims22
A stage for supporting a substrate comprising:
- a base positioned below an optical system, the base being characterized by a surface having a flatness and a size that is at least a size of a field of view of the optical system;
- and,
- a chuck that substantially conforms to the surface of the base, so that the chuck has the flatness of the base to allow for substrate processing.
6-13. (canceled)
15-40. (canceled)
A stage for supporting a substrate comprising:
- a means for supporting a chuck positioned below an optics, the means being characterized by a surface having a flatness and a size that is at least a size of a field of view of the optics;
- and,
- a chuck that substantially conforms to the surface of the means, so that the chuck has the flatness of the means to allow for substrate processing.
A method for supporting a chuck with a flatness over a base comprising:
- conforming the chuck to the base with the flatness and a size that is at least a size of a field of view of a projection camera;
- moving the chuck relative to the base to process different parts of a substrate;
- and
- processing the substrate over the base that provides the flatness for the processing.
1 more element
Dependencies are inferred from the claim text.