Measuring a Process Parameter for a Manufacturing Process Involving Lithography

A non-transitory computer readable product comprising machine-readable instructions for causing a processor to perform the operations comprising:

• designing a metrology target design pattern using a plurality of functional modules;
• determining a layout of a patterning device based on the metrology target design pattern;
• modeling, by the plurality of functional modules, a performance of the metrology target design pattern based on at least one of physical properties of the patterning device, optical components of a lithography system, a resist used in a lithographic process, post-resist processes, and a properties of a metrology system;
• and
• determining a metrology target parameter of the metrology target design pattern based on the modelling.

A system comprising:

• a memory;
• and
• at least one processor coupled to the memory, wherein the at least one processor is configured to:
• design a metrology target design pattern using a plurality of functional modules;
• determine a layout of a patterning device based on the metrology target design pattern;
• model, by the plurality of functional modules, a performance of the metrology target design pattern based on at least one of physical properties of the patterning device, optical components of a lithography system, a resist used in a lithographic process, post-resist processes, and a properties of a metrology system;
• and
• determine a metrology target parameter of the metrology target design pattern based on the modelling.