Underlayer film-forming composition, pattern-forming method, copolymer, and monomer for underlayer film-forming composition
AssigneeOji Holdings Corporation
InventorsKimiko HATTORI, Kazuyo MORITA
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AssigneeOji Holdings Corporation
InventorsKimiko HATTORI, Kazuyo MORITA
Estimating the term…
An object of the present invention is to provide an underlayer film-forming composition capable of forming an underlayer film which remains with a high proportion in an organic solvent, has a low UV reflectivity, and is excellent in etching resistance. The present invention relates to an underlayer film-forming composition, which contains a copolymer and an organic solvent and is used for patterning, wherein the copolymer contains: (a) a unit derived from a sugar derivative; (b) a unit derived from a compound having a light antireflection function; and (c) a unit derived from a compound capable of cross-coupling the copolymer, the unit derived from a sugar derivative (a) is at least one selected from a unit derived from a pentose derivative and a unit derived from a hexose derivative, and the underlayer film-forming composition is used for metal introduction.
An underlayer film-forming composition, which contains a copolymer and an organic solvent and is used for patterning,
A copolymer containing:
A monomer for an underlayer film-forming composition, which is represented by the following formula (1′) or the following formula (2′):
Dependencies are inferred from the claim text.