Active-ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and method for manufacturing electronic device

Abstract

An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having an excellent pattern line width roughness (LWR). In addition, another object of the present invention is to provide: a resist film, a pattern forming method, and a method for manufacturing an electronic device, each of which uses the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a resin including a repeating unit derived from a monomer having a salt structure and a repeating unit having a group whose polarity increases through decomposition by the action of an acid, the salt structure consists of an anionic structure moiety and an actinic ray-sensitive decomposable or radiation-sensitive decomposable cationic structure moiety, and a pKa of a monomer obtained by substituting the cationic structure moiety in the salt structure with a hydrogen atom is −0.80 or more.

Dependencies are inferred from the claim text.