Pattern-forming material, pattern-forming method, and monomer for pattern-forming material
AssigneeOji Holdings Corporation
InventorsKazuyo MORITA, Kimiko HATTORI
Life of this patent
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Abstract
An object of the present invention is to provide a pattern-forming film having excellent etching resistance. The present invention relates to a pattern-forming material including a polymer containing oxygen atoms, in which the polymer has an oxygen atom content of 20% by mass or more with respect to the total mass of the polymer, and the polymer has a silicon atom content of 10% by mass or less with respect to the total mass of the polymer.
Claims12
A pattern-forming material comprising a polymer containing oxygen atoms,
- wherein the polymer has an oxygen atom content of 20% by mass or more with respect to the total mass of the polymer, and
- the polymer has a silicon atom content of 10% by mass or less with respect to the total mass of the polymer.
A monomer for a pattern-forming material, which is represented by the following formula (1′) or the following formula (2′):
- wherein, in the formula (1′), each R independently represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, an alkyl group, an acyl group, an aryl group, a trimethylsilyl group, or a phosphoryl group, and a plurality of R1 may be the same or different;
- R′ represents a hydrogen atom, —OR11, or —NR12;
- R″ represents a hydrogen atom, —OR11, —COOR13, or —CH2OR13, provided that R11 represents a hydrogen atom, an alkyl group, an acyl group, an aryl group, a trimethylsilyl group, or a phosphoryl group, R12 represents a hydrogen atom, an alkyl group, a carboxyl group, or an acyl group, a plurality of R12 may be the same or different, and R represents a hydrogen atom, an alkyl group, an acyl group, an aryl group, a trimethylsilyl group, or a phosphoryl group;
- R5 represents a hydrogen atom or an alkyl group;
- and
- each Y1 independently represent a single bond or a linking group;
- wherein, in the formula (2′), each R201 independently represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, an alkyl group, an acyl group, an aryl group, a trimethylsilyl group, or a phosphoryl group, and a plurality of R201 may be the same or different;
- R′ represents a hydrogen atom, —OR11, or —NR122;
- and
- R″ represents a hydrogen atom, —OR11, —COOR13, or —CH2OR13, provided that R11 represents a hydrogen atom, an alkyl group, an acyl group, an aryl group, a trimethylsilyl group, or a phosphoryl group, R12 represents a hydrogen atom, an alkyl group, a carboxyl group, or an acyl group, a plurality of R12 may be the same or different, and R13 represents a hydrogen atom, an alkyl group, an acyl group, an aryl group, a trimethylsilyl group, or a phosphoryl group.
Dependencies are inferred from the claim text.