Display device and method of fabricating the same

A method of fabricating a display device comprising:

• forming a semiconductor layer comprising a source region, a drain region and a channel region on a base;
• forming a first insulating layer on the semiconductor layer;
• forming a gate line on the first insulating layer in a first direction, the gate line overlapping the channel region;
• forming a second insulating layer on the gate line;
• forming a data line on the second insulating layer in a second direction intersecting the first direction, the data line contacts a portion of the source region;
• forming a third insulating layer on the data line;
• forming a contact hole in the first insulating layer, the second insulating layer and the third insulating layer to expose the drain region;
• forming a drain electrode on the third insulating layer, the drain electrode being in contact with the drain region exposed through the contact hole;
• forming a first protective electrode on the drain electrode to overlap the drain electrode;
• forming a fourth insulating layer on the third insulating layer where the first protective electrode is formed;
• forming a contact hole in the fourth insulating layer to expose the first protective electrode;
• and
• forming a pixel electrode on the fourth insulating layer, the pixel electrode contacting the first protective electrode exposed through the contact hole in the fourth insulating layer.