US 2020/0400951 A1 · SURFACE-RELIEF GRATING WITH PATTERNED REFRACTIVE INDEX MODULATION

Abstract

Techniques disclosed herein relate generally to surface-relief structures. In one embodiment, a surface-relief grating includes a plurality of grating ridges. The plurality of grating ridges includes a first set of grating ridges characterized by a first refractive index, and a second set of grating ridges interleaved with the first set of grating ridges and characterized by a second refractive index different from the first refractive index. The plurality of grating ridges is imprinted in a polymer layer by a nanoimprint lithography process and is exposed to a light pattern to form the first set of grating ridges and the second set of grating ridges that have different refractive indices.

Claims20

Dependent claims

A method comprising:

imprinting, in an organic material layer, a surface-relief structure including a plurality of grating ridges, the organic material layer including a photosensitive base resin that includes monomers;
generating a light pattern that includes bright regions and dark regions;
and
exposing the surface-relief structure to the light pattern to polymerize the monomers in a set of grating ridges of the plurality of grating ridges in the bright regions and increase a refractive index of the set of grating ridges of the plurality of grating ridges in the bright regions.

1 more element

Dependencies are inferred from the claim text.

Surface-relief grating with patterned refractive index modulation

Life of this patent

Surface-relief grating with patterned refractive index modulation

Life of this patent

Abstract

Claims20