Metal mask substrate for vapor deposition, metal mask for vapor deposition, production method for metal mask substrate for vapor deposition, and production method for metal mask for vapor deposition

A method for manufacturing a vapor deposition metal mask substrate, the method comprising:

• forming a nickel-containing metal sheet on an electrode surface by electrolysis;
• and
• separating the nickel-containing metal sheet from the electrode surface, wherein
• the nickel-containing metal sheet includes an obverse surface and a reverse surface, which is opposite to the obverse surface,
• at least one of the obverse surface and the reverse surface is a target surface for placing a resist layer, and
• the electrolysis causes the target surface to have a surface roughness Sa of less than or equal to 0.019 μm and causes the target surface to have a surface roughness Sz of less than or equal to 0.308 μm.

A method for manufacturing a vapor deposition metal mask substrate, the method comprising:

• forming a nickel-containing metal sheet on an electrode surface by electrolysis;
• and
• separating the nickel-containing metal sheet from the electrode surface, wherein
• the nickel-containing metal sheet includes an obverse surface and a reverse surface, which is opposite to the obverse surface,
• at least one of the obverse surface and the reverse surface is a target surface for placing a resist layer, and
• the electrolysis causes a specular reflectance of incident light to the target surface to be between 53.0% and 97.0%, inclusive.