Techniques for controlling precursors in chemical deposition processes
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsElaina Babayan, Sarah White, Vijay Venugopal, Jonathan Bakke
Life of this patent
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Abstract
An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.
Claims20
An apparatus for controlling precursor flow, comprising:
- an ampoule to output a precursor;
- a sensor assembly communicatively coupled to the source, and comprising:
- a cell, coupled to the source, to receive and conduct the precursor;
- a detector, to detect light transmitted through the cell;
- and
- a control system, the control system arranged to determine a precursor flux value based upon a change in detected light intensity received from the cell during flow of the precursor through the cell, the control system comprising:
- a temperature control processor, configured to:
- determine a flux error value based upon the precursor flux value;
- determine a temperature adjustment ΔT, based upon the flux error value;
- and
- calculate a new set of temperature setpoints to be applied to the ampoule;
- and
- an end-of-life processor, the end-of-life processor configured to:
- check for an end-of ampoule-life condition when the new set of temperature setpoints is not within the predetermined set of temperature limits.
A method of controlling precursor flow, comprising:
- measuring a change in detected signal intensity in a cell of the gas delivery system, caused by the flow of a precursor;
- determining a precursor flux value based upon the change in the detected signal intensity;
- determining a flux error value based upon the precursor flux value;
- calculating a new set of temperature setpoints to be applied to the ampoule;
- and
- checking for an end-of ampoule-life condition when the new set of temperature setpoints is not within a predetermined set of temperature limits.
A method, comprising:
- determining a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor;
- determining a flux error value based upon the precursor flux value;
- determining a temperature adjustment ΔT, based upon the flux error value;
- calculating a new set of temperature setpoints to be applied to the ampoule;
- and
- checking for an end-of ampoule-life condition when the new set of temperature setpoints is not within the predetermined set of temperature limits.
Dependencies are inferred from the claim text.