Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording Medium

A method of manufacturing a semiconductor device comprising:

• (a) loading a substrate into a process chamber of a substrate processing apparatus comprising:
• the process chamber in which the substrate is processed;
• a first gas supply system configured to supply a first gas onto the substrate in the process chamber and comprising a plurality of tanks configured to store the first gas, wherein the first gas is heated in the plurality of the tanks;
• and a second gas supply system configured to supply a second gas onto the substrate in the process chamber;
• (b) supplying the first gas onto the substrate in the process chamber through the first gas supply system while switching among the plurality of the tanks;
• and
• (c) supplying the second gas onto the substrate in the process chamber through the second gas supply system.

A non-transitory computer-readable recording medium storing a program related to a substrate processing apparatus comprising:

• a process chamber in which a substrate is processed;
• a first gas supply system configured to supply a first gas onto the substrate in the process chamber and comprising a plurality of tanks configured to store the first gas, wherein the first gas is heated in the plurality of the tanks;
• and a second gas supply system configured to supply a second gas onto the substrate in the process chamber, wherein the program cases, by a computer, the substrate processing apparatus to perform:
• (a) loading the substrate into the process chamber of the substrate processing apparatus;
• (b) supplying the first gas onto the substrate in the process chamber through the first gas supply system while switching among the plurality of the tanks;
• and
• (c) supplying the second gas onto the substrate in the process chamber through the second gas supply system.