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US 2020/0399754 A1Published application
Solid precursor feed system for thin film depositions
AssigneeMetal Oxide Technologies, Inc.
InventorsMikhail NOVOZHILOV, Alex IGNATIEV
Life of this patent
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Abstract
A dry powder MOCVD vapor source system is disclosed that utilizes a gravimetric powder feeder, a feed rate measurement and feeder control system, an evaporator and a load lock system for continuous operation for thin film production, particularly of REBCO type high temperature superconductor (HTS) tapes.
Claims20
A precursor feed system for deposition of thin films, the system comprising:
- a powder feeder assembly comprising a feed screw device and a powder vessel for housing a precursor powder;
- a load lock assembly comprising a pressure isolated chamber for reloading the powder feeder assembly powder vessel;
- a weighing mechanism coupled to the powder vessel and configured to provide continuous mass data of precursor powder in the powder vessel;
- a control system comprising a PID loop and a data processor;
- and
- an evaporator configured to receive the precursor powder from the powder feeder assembly and evaporate the powder,
- wherein the control system data processor further comprises an algorithm configured to convert the continuous mass data from the weighing mechanism to a feed screw rate to deliver a target precursor powder feed rate to the evaporator.
4 more elements
A precursor feed system for deposition of thin films, the system comprising:
- a powder feeder assembly comprising a feed screw device and a powder vessel for housing a precursor powder;
- a load lock assembly comprising a pressure isolated chamber for reloading the powder feeder assembly powder vessel;
- a control system comprising a PID loop and a data processor;
- a process variable input receivable by the control system;
- and
- an evaporator configured to receive the precursor powder from the powder feeder assembly and evaporate the powder,
- wherein the control system data processor further comprises an algorithm configured to convert the process variable input to a feed screw rate to deliver a target precursor powder feed rate to the evaporator.
4 more elements
A method for manufacturing a high temperature superconductor, the method comprising:
- introducing a substrate to a reactor;
- providing an evaporator operatively coupled to a precursor powder feed assembly comprising a screw feed device and a precursor powder vessel coupled to a weighing mechanism;
- loading a precursor powder to a load lock assembly configured to supply precursor powder to the precursor powder feed assembly, wherein the precursor powder is comprised of at least one component of a high temperature thin film superconductor;
- monitoring the precursor powder vessel weight;
- controlling the feed screw rate based upon the powder vessel weight in order to provide a target precursor powder feed rate to the evaporator;
- evaporating the precursor powder in the evaporator;
- transporting the evaporated precursor into the reactor;
- and
- depositing the thin film upon the substrate in the reactor.
6 more elements
Dependencies are inferred from the claim text.