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US 2020/0399505 A1Published application
Polishing composition
AssigneeFujimi Incorporated
InventorsYasuaki ITO, Naoto NOGUCHI
Life of this patent
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Abstract
The present invention provides a polishing composition with which polishing rates can be effectively improved and which is for polishing works to be polished. The polishing composition comprises water, abrasive grains, an oxidant, and a polishing accelerator. The polishing accelerator comprises at least one metal salt selected from the group consisting of alkali metal salts and alkaline-earth metal salts.
Claims10
A polishing composition to be used in polishing an object to be polished, the polishing composition comprising:
- water, an abrasive, an oxidant, and a polishing removal accelerator,
- wherein the polishing composition contains at least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt as the polishing removal accelerator.
Dependencies are inferred from the claim text.