Polishing agent for synthetic quartz glass substrate and method for polishing synthetic quartz glass substrate
AssigneeShin-Etsu Chemical Co., Ltd.
InventorMitsuhito TAKAHASHI
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Abstract
A polishing agent for a synthetic quartz glass substrate. The polishing agent contains wet ceria particles and non-spherical silica particles. The wet ceria particles have an average primary particle diameter of 30 nm to 50 nm. The non-spherical silica particles have an average primary particle diameter of 80 nm to 120 nm. This provides a polishing agent for a synthetic quartz glass substrate, the polishing agent having high polishing rate and being capable of sufficiently reducing generation of defects due to polishing.
Claims17
1-5. (canceled)
A polishing agent for a synthetic quartz glass substrate, the polishing agent comprising:
- wet ceria particles;
- and
- non-spherical silica particles, wherein
- the wet ceria particles have an average primary particle diameter of 30 nm to 50 nm, and
- the non-spherical silica particles have an average primary particle diameter of 80 nm to 120 nm.
Dependencies are inferred from the claim text.