Electrostatic chuck device

Abstract

This electrostatic chuck device includes an electrostatic chuck part which has a placement surface on one main surface thereof to place a plate-shaped sample and has an electrode for electrostatic attraction; a temperature controlling base part which is provided at a side opposite to the placement surface of the electrostatic chuck part electrostatic chuck part and is configured to cool the electrostatic chuck part; and a heater element disposed between the electrostatic chuck part and the temperature controlling base part or in the electrostatic chuck part in a layer form, in which the electrostatic chuck part and the temperature controlling base part are parts in which a plurality of through holes communicating in a thickness direction are provided, the heater element has a first site formed in a band shape and a second site continuous with the first site, wherein the second site is formed to have in a band shape and a closed ring shape, one through hole of the through holes is disposed on an inner peripheral side of the second site in plan view, and a width of the second site is in a range of 0.25 times to 0.75 times a width of the first site.

Dependencies are inferred from the claim text.