Composition analysis technology of ultramicro volume liquid by laser ablation plasma mass spectrometry

A method of composition analysis of ultramicro-volume liquid by laser ablation plasma mass spectrometry, the method comprising the steps of:

• Step 1. cleaning and preparation of a dropping plate device:
• in order to avoid mixing with and contaminating by an external substance, soaking a tailor-made dropping plate successively in hydrochloric acid solution and a hydrofluoric acid solution for two hours, cleaning with deionized water, then rinsing with anhydrous ethanol for three times, and baking to dryness in an oven at 60° C. for later use;
• Step 2. preparation of liquid to be tested:
• pipetting a certain amount of the liquid to be tested by using a pipette gun, mixing the liquid with a 1 ppm rhodium standard solution according to a ratio of 1:1, and placing the mixture in an analytical container for later use;
• wherein, the rhodium concentration after dilution is 0.5 ppm, which is used as an internal standard element for convenience of subsequent calculation;
• Step 3. loading of ultramicro liquid:
• pipetting the liquid to be tested by using a 0.01 ml pipette gun in a low-temperature environment, and dropping the liquid into one dropping pit in the dropping plate, so that the liquid level is slightly higher than an overflow table in the dropping plate;
• dropping different liquid samples into different dropping pits by the same method;
• gradually covering the dropping pit with an analysis film having an area 1.5 times larger than that of the dropping plate from one side of the dropping plate after the dropping is completed, and tightly adhering the thin film onto the dropping plate by using a transparent adhesive tape after all the dropping pits are covered, and appropriately stretching and tightening the thin film, so that the thin film is in close contact with the liquid level, and excess liquid overflows from the dropping pit along the overflow table to enter an isolation groove;
• and placing the dropping plate covered by the thin film in a LA-ICPMS universal solid sample chamber, and fixing the dropping plate well for later testing;
• Step 4. state debugging and parameter setting of a LA-ICPMS instrument:
• closing and vacuumizing the sample chamber, and setting relevant parameters when the silicon count falls below 40,000, wherein helium and hydrogen are used as carrier gases, the flow rate of helium is set to 370 ml/min, the flow rate of nitrogen is set to 5 ml/min, the laser energy is 80 mJ, the laser ablation frequency is 5-10 Hz, and the laser ablation beam spot is 50-110 μm;
• the ablation time sequence is set as:
• laser pre-ablation of 120-150 pulses, and a signal collection time of 65 seconds, wherein a blank time is 25 seconds and a ablation time is 40 seconds;
• Step 5. LA-ICPMS test analysis:
• in the test adopting an external standard-sample-external standard method, i.e., using glass standard matters NIST610 and NIST 612 as double external standards, and setting a test sequence as 2 NIST612+2 NIST610+5 sample analysis+2 NIST612+2 NIST610;
• and
• Step 6. processing and data correction of LA-ICPMS analysis signals:
• adopting a correction software to select a signal interval for the obtained data signals, and then adopting a “multiple external standards-single internal standard” method to carry out calculation and correction, so as to obtain final data.