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US 2020/0395199 A1Published application
Substrate treatment apparatus and method of cleaning inside of chamber
AssigneeASM IP Holding B.V.
InventorRyo MIYAMA
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Abstract
Examples of a substrate treatment apparatus includes a chamber, a susceptor provided in the chamber and having an electrode therein, a metal plate facing the susceptor, a plurality of impedance adjusters having different impedances, and a selection device configured to connect one of the plurality of impedance adjusters to the electrode.
Claims11
A substrate treatment apparatus, comprising:
- a chamber;
- a susceptor provided in the chamber and having an electrode therein;
- a metal plate facing the susceptor;
- a plurality of impedance adjusters having different impedances;
- and
- a selection device configured to connect one of the plurality of impedance adjusters to the electrode.
3 more elements
A cleaning method, comprising:
- applying a high-frequency power to a metal plate facing a susceptor in a chamber while an electrode of the susceptor is grounded via a first impedance adjuster to generate plasma in a first region between the susceptor and the metal plate;
- and
- applying a high-frequency power to the metal plate while the electrode is grounded via a second impedance adjuster of an impedance different from that of the first impedance adjuster to generate plasma in the first region and a second region, the second region being on a lower surface side of the susceptor.
Dependencies are inferred from the claim text.