Photosensitive composition, film, method for forming pattern, color filter, solid-state imaging element, and image display device
AssigneeFUJIFILM Corporation
InventorsKazuto Shimada, Naotsugu Muro
Life of this patent
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Abstract
Provided are a photosensitive composition used for forming a negative tone pattern by development with a developer including an organic solvent, the photosensitive composition including a coloring material, a resin having solubility which decreases in the organic solvent due to an action of acid, and a photoacid generator; a film formed of the photosensitive composition; a method of forming a pattern; a color filter; a solid-state imaging element; and an image display device.
Claims17
A photosensitive composition used for forming a negative tone pattern by development with a developer including an organic solvent, the photosensitive composition comprising:
- a coloring material;
- a resin having solubility which decreases in the organic solvent due to an action of acid;
- and
- a photoacid generator.
Dependencies are inferred from the claim text.