Sensor and production method for same
AssigneeSumitomo Chemical Company, Limited
InventorsMegumi HAYASAKA, Yoshifumi KOMATSU, Yoshihiro HARADA
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Abstract
A sensor including a detection film formed from a resin composition, a first electrode provided on a first surface of the detection film, and a second electrode provided on a second surface of the detection film, wherein the first surface of the detection film includes a rough surface having fine irregularities with a root mean square roughness (Rq) of 0.3 μm to 3.0 μm in a portion that is in contact with the first electrode.
Claims12
A sensor, comprising:
- a detection film formed from a resin composition;
- a first electrode provided on a first surface of the detection film;
- and
- a second electrode provided on a second surface of the detection film,
- wherein the first surface of the detection film includes a rough surface having fine irregularities with a root mean square roughness (Sq) of 0.3 μm to 3.0 μm in a portion that is in contact with the first electrode.
A sensor comprising a sensor element, the sensor element including:
- a detection film formed from a resin composition;
- a first electrode provided on a first surface of the detection film;
- and
- a second electrode provided on a second surface of the detection film,
- wherein a surface having the first electrode of the sensor element includes a rough surface having fine irregularities with a root mean square roughness (Sq) of 0.3 μm to 3.0 μm.
A method for producing a sensor, the method comprising:
- a step of providing a substrate;
- a step of forming a second electrode on the substrate;
- a step of forming on the second electrode a detection film having a resin as a main component;
- a step of roughening at least a part of the surface of the detection film opposite to the second electrode to form a rough surface;
- and
- a step of forming a first electrode by plating on a region including the rough surface of the surface of the detection film,
- wherein the rough surface has a root mean square roughness (Sq) of 0.3 μm to 3.0 μm.
A method for producing a sensor, the method comprising:
- a step of providing a substrate;
- a step of forming a second electrode on the substrate;
- a step of forming on the second electrode a detection film having a resin as a main component;
- and
- a step of forming a first electrode by plating on the surface of the detection film opposite to the second electrode,
- wherein the surface having the first electrode includes a rough surface having fine irregularities with a root mean square roughness (Sq) of 0.3 μm to 3.0 μm.
Dependencies are inferred from the claim text.