Resin composition, method for producing resin composition, film formation method, and cured product

A resin composition comprising a silicon-containing resin component and a solvent, wherein:

• the silicon-containing resin component comprises (I):
• (I) a polysilane-polysiloxane resin having a polysilane structure (I-1) and a polysiloxane structure (I-2),
• the solvent comprises at least one solvent selected from the group consisting of a terpene compound having at least one group selected from the group consisting of a hydroxy group and an acetoxy group, and a cyclic skeleton-containing acetate compound (excluding the terpene compound),
• wherein the polysiloxane structure (I-2) comprises a hydrolyzed and condensed structure of at least one silicon compound selected from the group consisting of silicon compounds represented by the following general formulas (A-1-1) to (A-1-4):
• R1R2R3SiX1 (A-1-1)
• R4R6SiX22 (A-1-2)
• R6SiX33 (A-1-3)
• SiX44 (A-1-4)
• wherein X1 to X4 are each independently a hydrolyzable group, and wherein R1, R2, R3, R4, R5, and R6 are each independently a hydrogen atom or an organic group, and hydrogen atoms in the organic group may be substituted with a halogen atom,
• wherein the polysilane structure (I-1) comprises a structure corresponding to at least one selected from the group consisting of polysilane compounds represented by the following general formulas (A-2-1) and (A-2-2):
• (R7R8R9Si)a1(R10R11Si)a2(R12Si)a3(Si)a4 (A-2-1)
• wherein R7, R8, R9, R10, R11 and R12 are each independently a hydrogen atom, a hydroxyl group, or an organic group, and a1, a2, a3 and a4 are each independently a molar fraction, a1+a2+a3+a4=1, 0≤a1≤1, 0≤a2≤1, 0≤a3≤1 and 0≤a4≤1,
• wherein Ra1 and Ra2 each independently represents a hydrogen atom, a hydroxyl group, or an organic group, and n represents an integer of 5 to 20, and wherein (I) the polysilane-polysiloxane resin comprises at least one selected from the group consisting of a structure represented by the following general formulas (H1), (H2) and (H3):
• A1-A2O—Psi-OA2-A1 (H 1)
• A1-A2O—Psi-OH (H 2)
• A1-A2O—Psi-OA2-A1-A2O—Psi-OA2-A1 (H 3)
• wherein in the general formulas (H1) and (H2), A1 each independently represents a polysiloxane structure which includes at least one of structures represented by the general formulas (A1) shown below, and also includes at least one leftmost structure,
• in the general formulas (H3), A1, -A2O—, —OA2-, and Psi are the same as defined in the general formula (H1), and
• A2O— each independently represents a linking group which is any one of structures represented by the general formula (A2) shown below, in the general formulas (H1), —OA2- represents an —OSi— structure in which the order of bonding a main chain —SiO— in the general formula (A1) shown below is reversed, Psi represents a polysilane structure (I-1):
• wherein in the general formulas (A1) and (A2), R1, R2, R3, R4, R5, and R6 are each independently a hydrogen atom or an organic group, and hydrogen atoms in the organic group may be substituted with a halogen atom.