Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator

A compound having a following chemical formula (1):

• wherein in formula (1), R1 represents a hydroxy group, an alkoxy group or an organic group other than the aforementioned substituents;
• R2, R3, R5 and R6 each independently represent hydrogen atom, halogen atom, hydroxy group, alkoxy group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, cyano group, sulfino group, sulfo group, sulfonato group, phosphino group, phosphinyl group, phosphono group, phosphonato group, amino group, ammonio group or an organic group other than the aforementioned substituents, each of R2, R3, R5 and R6 plurally existing may be the same or different from each other R2 and R3 on the same benzene ring may be connected to form a ring structure and R5 and R6 on the same benzene ring may be connected to form a ring structure;
• R4 each independently represents a hydrogen atom or an organic group having a thioether bond, and at least one of R4 is the organic group having a thioether bond;
• the organic group having a thioether represented by R4 and R3 or R5 may be connected to form a ring structure;
• R7 and R9 each independently represent a hydrogen atom or an alkyl group having a carbon number of 1 to 4;
• R5 represents an alkylene groups or an arylene group;
• X represents oxygen atom, sulfur atom or NR10;
• and R10 represents a hydrogen atom or an alkyl group having a carbon number of 1 to 4.