Showerhead With Inlet Mixer

A processing chamber apparatus comprising:

• a chamber body having a top wall, bottom wall and at least one sidewall defining a processing volume;
• a showerhead having a front plate and a back plate spaced to form a gas volume, the front plate having an inner surface adjacent the gas volume and an outer surface with a plurality of apertures extending therethrough, the gas volume having a center region and an outer region, a first inlet in fluid communication with the center region of the gas volume, the first inlet having an inside and an outside, a mixer disposed on the inside of the inlet to increase gas flow temperature, and, optionally, a second inlet in fluid communication with the first inlet, the second inlet substantially perpendicular to the first inlet;
• and
• a substrate support spaced a distance from the front plate of the showerhead.

A method of depositing a film on a substrate, the method comprising:

• flowing one or more of a precursor, an oxidant, or a reductant through a showerhead, the showerhead having a front plate and a back plate spaced to form a gas volume, the front plate having an inner surface adjacent the gas volume and an outer surface with a plurality of apertures extending therethrough, the gas volume having a center region and an outer region, a first inlet in fluid communication with the center region of the gas volume, the first inlet having an inside and an outside, a mixer disposed on the inside of the first inlet to increase gas flow temperature, and a second inlet in fluid communication with the first inlet, the second inlet substantially perpendicular to the first inlet;
• delivering a flow from the front plate of the showerhead to a substrate;
• and
• forming a film on the substrate.