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US 2020/0370175 A1Published application
Apparatus operating method and substrate processing apparatus
AssigneeASM IP Holding B.V.
InventorNobuaki TANABE
Life of this patent
Estimating the term…
Abstract
Examples of an apparatus operating method includes providing gas to an inside of a reactor chamber to perform processing on a substrate in the inside of the reactor chamber, and providing plasma, not via the reactor chamber, to a discharge line communicating with the reactor chamber or a dry pump communicating with the discharge line during loading or unloading of the substrate to/from the reactor chamber to perform cleaning of at least one of the discharge line and the dry pump.
Claims16
An apparatus operating method comprising:
- providing gas to an inside of a reactor chamber to perform processing on a substrate in the inside of the reactor chamber;
- and
- providing plasma, not via the reactor chamber, to a discharge line communicating with the reactor chamber or a dry pump communicating with the discharge line during loading or unloading of the substrate to/from the reactor chamber to perform cleaning of at least one of the discharge line and the dry pump.
A substrate processing apparatus comprising:
- a reactor chamber;
- a remote plasma unit that communicates with the reactor chamber via a connection line and provides plasma;
- a dry pump that communicates with the reactor chamber via a discharge line and discharges gas of the reactor chamber;
- and
- a bypass line connecting the connection line and the discharge line.
2 more elements
A substrate processing apparatus comprising:
- a reactor chamber;
- a dry pump that communicates with the reactor chamber via a discharge line and discharges gas of the reactor chamber;
- and
- an exclusive remote plasma unit directly connected to the dry pump.
1 more element
Dependencies are inferred from the claim text.