Back to results
US 2020/0369919 A1Published application
Polishing liquid composition for silicon oxide film
AssigneeKao Corporation
InventorYohei UCHIDA
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
AssigneeKao Corporation
InventorYohei UCHIDA
Estimating the term…
A polishing liquid composition for a silicon oxide film according to the present invention includes cerium oxide particles, a water-soluble macromolecular compound, and an aqueous medium, and the water-soluble macromolecular compound is a water-soluble macromolecular compound including a betaine structure, excluding carbobetaine homopolymers and sulfobetaine homopolymers. The water-soluble macromolecular compound is preferably a water-soluble macromolecular compound containing a constitutional unit A including a betaine structure, and a constitutional unit B that is a constitutional unit other than the constitutional unit A and contains at least one group of a primary amino group, a secondary amino group, a tertiary amino group, a quaternary ammonium group, and salts thereof.
A polishing liquid composition for a silicon oxide film, comprising:
A polishing liquid kit for preparing a polishing liquid composition for a silicon oxide film, comprising:
An additive composition for silicon oxide film polishing to be used together with a dispersion liquid obtained by dispersing cerium oxide particles in an aqueous medium, comprising:
Dependencies are inferred from the claim text.