A method for manufacturing a fluid sensor device and a fluid sensor device

A method for manufacturing a fluid sensor device, the method comprising:

• forming a fin-FET arrangement in a silicon layer of a silicon-on-insulator arrangement, comprising a silicon wafer, a buried oxide and the silicon layer, wherein the fin-FET arrangement is configured to function as a fluid sensitive fin-FET arrangement;
• bonding the silicon-on-insulator arrangement to a temporary carrier;
• removing the silicon wafer;
• bonding the temporary carrier to a CMOS arrangement comprising a metallization layer and a planarized dielectric layer, wherein the bonding is performed via a dielectric layer of the silicon-of-insulator arrangement, such as the buried oxide, and the planarized dielectric layer;
• removing the temporary carrier;
• forming a contact to the metallization layer and the fin-FET arrangement, wherein the contact comprises an interconnecting structure configured to interconnect the metallization layer and the fin-FET arrangement;
• forming a channel comprising an inlet and an outlet, wherein the channel is configured to at least partially expose the fin-FET arrangement and to allow a fluid comprising an analyte to contact the fin-FET arrangement.

A fluid sensor device comprising:

• a CMOS arrangement comprising a metallization layer;
• a fin-FET arrangement configured to function as a fluid sensitive fin-FET arrangement and to generate a fluid sensor signal, wherein the fin-FET arrangement is arranged over the CMOS arrangement;
• a contact to the metallization layer and the fin-FET arrangement, wherein the contact comprises an interconnecting structure configured to interconnect the metallization layer and the fin-FET arrangement;
• wherein the fin-FET arrangement is configured to transfer the fluid sensor signal to the CMOS arrangement via the interconnecting structure, and wherein the CMOS arrangement is configured to process the fluid sensor signal;
• and wherein the fluid sensor device further comprises
• a channel comprising an inlet and an outlet, wherein the fin-FET arrangement is configured to be at least partially exposed in the channel to allow a fluid comprising an analyte to contact the fin-FET arrangement.